SubjectsSubjects(version: 877)
Course, academic year 2020/2021
  
Physics of thin films and surfaces - AP444008
Title: Physics of thin films and surfaces
Guaranteed by: Department of Physics and Measurement (444)
Actual: from 2019
Semester: both
Points: 0
E-Credits: 0
Examination process:
Hours per week, examination: 2/1 other [hours/week]
Capacity: winter:unlimited / unlimited (unknown)
summer:unknown / unknown (unknown)
Min. number of students: unlimited
Language: English
Teaching methods: full-time
Level:  
For type: doctoral
Note: can be fulfilled in the future
you can enroll for the course in winter and in summer semester
Guarantor: Novotný Michal Ing. Ph.D.
Vlček Jan Ing. Ph.D.
Interchangeability : P444008
Annotation -
Last update: Pátková Vlasta (19.11.2018)
The subject deals physics of thin films and nanostructures, it discusses deposition techniques (physical and chemical) and advanced methods for characterization of morphology, physical, physical-chemical and chemical properties of the surfaces. Students will become familiar with theoretical principles and descriptions as well as modern experimental approaches.
Aim of the course -
Last update: Pátková Vlasta (19.11.2018)

Students will be familiar with technologies and methods used for preparation of thin films. They will have overview of diagnostic methods to analyze morphology, physical, physical-chemical and chemical properties. They will be able to choose optimal techniques and methods to fabricate and characterize thin films regarding the material nature.

Literature -
Last update: Novotný Michal Ing. Ph.D. (28.11.2018)

Z:

1. Ohring M.: Materials Science of Thin Films. Academic Press, San Diego 2002

2. Hoffman D., Singh B., Thomas J. H.: Handbook of Vacuum Science and Technology. Academic Press, San Diego 1998.

D:

1. Heide P.: X-RAY PHOTOELECTRON SPECTROSCOPY, An Introduction to Principles and Practices, Wiley, 2012

Learning resources -
Last update: Pátková Vlasta (19.11.2018)

The lectures posted on the web pages of the Institute of physics and measurements

Requirements to the exam -
Last update: Pátková Vlasta (19.11.2018)

none

Syllabus -
Last update: Pátková Vlasta (19.11.2018)

1. Basic characteristics of thin films and nanostructures, classification, properties

2. Thin film growth mechanisms, nucleation, coalescence, substrate

3. Polycrystalline, monocrystalline and amorphous thin films, epitaxy

4. Vacuum techniques in HV, UHV and XHV range

5. Physical vapor deposition (PVD), evaporation, sputtering, PLD, ALD

6. Chemical vapor deposition (CVD) and non-vacuum techniques of preparation of thin films

7. Morphology analyses – scanning probe microscopy (AFM, KPFM, STM)

8. Structure and morphology analyses – TEM, SEM, SAED, LEED, RHEED

9. X-ray and neutron diffraction and scattering (PXRD, GIXRD, GAXRD, SAXS, GISAXS, SANS, GISANS)

10. Ion spectroscopies (SIMS, HEIS, RBS, EBS)

11. Structure and composition analyses – Raman and IR spectroscopies, EDX, NMR, EPR

12. Photoelectron spectroscopy and microscopy (XPS, PEEM)

13. Electrotransport properties – four-point technique and Hall

14. Optical properties - ellipsometry, spectrophotometry, spectroscopy - UV-VIS

Entry requirements -
Last update: Pátková Vlasta (19.11.2018)

none

Registration requirements -
Last update: Pátková Vlasta (19.11.2018)

none

Course completion requirements -
Last update: Pátková Vlasta (19.11.2018)

oral examination

 
VŠCHT Praha