SubjectsSubjects(version: 855)
Course, academic year 2019/2020
  
Physics of thin films and surfaces - P444008
Title: Fyzika tenkých vrstev a povrchů
Guaranteed by: Department of Physics and Measurement (444)
Actual: from 2019
Semester: both
Points: 0
E-Credits: 0
Examination process:
Hours per week, examination: 2/1 other [hours/week]
Capacity: winter:unlimited / unlimited (unknown)
summer:unknown / unknown (unknown)
Min. number of students: unlimited
Language: Czech
Teaching methods: full-time
Level:  
For type: doctoral
Note: you can enroll for the course in winter and in summer semester
Guarantor: Vlček Jan Ing. Ph.D.
Novotný Michal Ing. Ph.D.
Is interchangeable with: AP444008
Annotation -
Last update: Novotný Michal Ing. Ph.D. (28.06.2018)
The subject deals physics of thin films and nanostructures, it discusses deposition techniques (physical and chemical) and advanced methods for characterization of morphology, physical, physical-chemical and chemical properties of the surfaces. Students will become familiar with theoretical principles and descriptions as well as modern experimental approaches.
Aim of the course -
Last update: Novotný Michal Ing. Ph.D. (27.08.2018)

Students will be familiar with technologies and methods used for preparation of thin films. They will have overview of diagnostic methods to analyze morphology, physical, physical-chemical and chemical properties. They will be able to choose optimal techniques and methods to fabricate and characterize thin films regarding the material nature.

Literature -
Last update: Vlček Jan Ing. Ph.D. (30.08.2019)

Z:

1. Hans Lüth: Solid Surfaces, Interfaces and Thin Films, Springer International Publishing, 2014

2. Donald L. Smith: Thin-Film Deposition: Principles and Practice, McGraw Hill Professional, 1995

3. Frank L., Král J.: Metody analýzy povrchů – iontové, sondové a speciální metody, Academia, Praha, 2002

4. Ohring M.: Materials Science of Thin Films. Academic Press, San Diego 2002

5. Hoffman D., Singh B., Thomas J. H.: Handbook of Vacuum Science and Technology. Academic Press, San Diego 1998.

D:

1. Heide P.: X-RAY PHOTOELECTRON SPECTROSCOPY, An Introduction to Principles and Practices, Wiley, 2012

Learning resources -
Last update: Novotný Michal Ing. Ph.D. (27.08.2018)

The lectures posted on the web pages of the Institute of physics and measurements

Requirements to the exam -
Last update: Novotný Michal Ing. Ph.D. (27.08.2018)

none

Syllabus -
Last update: Novotný Michal Ing. Ph.D. (27.08.2018)

1. Basic characteristics of thin films and nanostructures, classification, properties

2. Thin film growth mechanisms, nucleation, coalescence, substrate

3. Polycrystalline, monocrystalline and amorphous thin films, epitaxy

4. Vacuum techniques in HV, UHV and XHV range

5. Physical vapor deposition (PVD), evaporation, sputtering, PLD, ALD

6. Chemical vapor deposition (CVD) and non-vacuum techniques of preparation of thin films

7. Morphology analyses – scanning probe microscopy (AFM, KPFM, STM)

8. Structure and morphology analyses – TEM, SEM, SAED, LEED, RHEED

9. X-ray and neutron diffraction and scattering (PXRD, GIXRD, GAXRD, SAXS, GISAXS, SANS, GISANS)

10. Ion spectroscopies (SIMS, HEIS, RBS, EBS)

11. Structure and composition analyses – Raman and IR spectroscopies, EDX, NMR, EPR

12. Photoelectron spectroscopy and microscopy (XPS, PEEM)

13. Electrotransport properties – four-point technique and Hall

14. Optical properties - ellipsometry, spectrophotometry, spectroscopy - UV-VIS

Entry requirements -
Last update: Novotný Michal Ing. Ph.D. (27.08.2018)

none

Registration requirements -
Last update: Novotný Michal Ing. Ph.D. (27.08.2018)

none

Course completion requirements -
Last update: Novotný Michal Ing. Ph.D. (27.08.2018)

oral examination

Coursework assessment
Form Significance
Oral examination 100

 
VŠCHT Praha